University of Maryland Institute for Research in Electronics and Applied Physics
Institute for Research in Electronics and Applied Physics

Laboratory for Plasma Processing of Materials

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Group Members

Prof. Gottlieb Oehrlein, Principal Investigator


Research Group (April 2010)
From left: Elliot Bartis, Nick Fox-Lyon, Florian Weilnboeck, Matthew Graves,
Ming-Shu Kuo (PhD, 2010), Evelina Vogli, Lijun Wang, Gottlieb Oehrlein


Research Group (May 2006)
From left: Deuk Lee, Li Ling, Ming-Shu Kuo, Robert Bruce, Bryan Orf,
Sebastian Engelmann, Gottlieb Oehrlein


Research Group (May 2002)
From left: Xuefung Hua (PhD, 2006), Xi Li, Daphne Fuentevilla, Gunwoo Kim,
Li Ling (PhD, 2006), Xiang Wang, Gottlieb Oehrlein


Former Graduate Students

Ph.D. Graduates

  • Neal Rueger, Micron Technology (USA)
  • Bernd Kastenmeier, IBM Corporation (USA)
  • Marc Schaepkens, General Electric Corporate R&D Center (USA)
  • Peter Matsuo, Fysix Corporation (USA)
  • Peter Wrschka, Infineon (USA)
  • Joseph Hernandez, IPEC SpeedFam (USA)
  • Marcus Doemling, Fysix Corporation (USA)
  • Theo Standaert, IBM Corporation (USA)
  • Li Ling, Applied Materials Corporation (USA)
  • Xuefeng Hua, Intel Corporation (USA)

M.S. Graduates

  • Xiang Wang
  • Gregor Dasbach
  • Ingo Martini
  • Eric Joseph
  • Eric Sanjuan

Former Visitors and Colleagues

  • Sjaak Beulens, ASM International (Netherlands)
  • Masanaga Fukasawa, SONY Corporation (Japan)
  • Christer Hedlund, Uppsala University, Uppsala (Sweden)
  • Andrew Li, Lam Research (USA)
  • Hongjiang Sun, Philips Corporation (USA)
  • Masatoshi Tokushima, NEC Corporation (Japan)


IREAP HomepagePPM Homepage
Xuefeng Hua Dr. Xi Li Daphne Fuentevilla Gunwoo Kim Li Ling Xiang Wang Prof. Gottlieb Oehrlein