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Graduate Student Seminar - 10/16/2015

"Vacuum Ultraviolet Polymer Etching and Modification by a Remote Atmospheric Pressure Plasma Jet"

by Andrew Knoll

Friday, October 16, 2015 -- 12:00 p.m.
Large Conference Room, 1207 Energy Research Facility

Advisor:  Professor Gottlieb Oehrlein

Atmospheric Pressure Plasma (APP) sources have been investigated recently for their potential uses in biological and surface treatment applications. We see that for a ring-APP jet source vacuum ultraviolet (VUV) radiation plays an important role in polymer modification and thickness loss. The effect of the local environment on the transmission of this VUV is also investigated. Finally we compare the importance of VUV for several different designs of APP sources.

For additional information about the IREAP Graduate Student Seminars, contact Peter Megson.

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