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Ballew, Nolan
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Ballew, Nolan
Technical Coordinator
Institute for Research in Electronics & Applied Physics
0121 Energy Research Facility
nballew@umd.edu
301-405-8929
OVERVIEW
Beneath the AVS Surface Spotlights IREAP Researcher Gottlieb Oehrlein
Innovative electron-beam-induced etching technique could revolutionize semiconductor manufacturing
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