Faculty Directory

Oehrlein, Gottlieb S.

Oehrlein, Gottlieb S.

Professor
Fellow, AVS
Fellow, International Plasma Chemistry Society
Fellow, International Union of Pure and Applied Chemistry
Materials Science and Engineering
Institute for Research in Electronics & Applied Physics
2119 Chemical and Nuclear Engineering Building

EDUCATION

  • Ph.D., Physics, State University of New York at Albany, 1981
  • M.S., Physics, State University of New York at Albarny, 1978
  • Vordiplom, Physics, Wurzburg University, Germany, 1976

BACKGROUND

Professor Oehrlein received a Vordiplom in physics from Würzburg University (Germany) in 1976, and M.S. and Ph.D. degrees in physics from the State University of New York at Albany in 1978 and 1981, respectively. Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY.

HONORS AND AWARDS

  • Nishizawa Award, International Symposium on Dry Process (2019)
  • John Thornton Memorial Award, American Vacuum Society (2019)
  • Most Valuable Reviewer, Journal of Vacuum Science and Technology (2019)
  • Fellow, International Plasma Chemistry Society (2017)
  • IBM Faculty Award (2010)
  • Plasma Prize, Plasma Science and Technology Division, American Vacuum Society (2005)
  • Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization (2003)
  • IBM Faculty Award (2002)
  • Fellow, International Union of Pure and Applied Chemistry (2000)
  • Fellow, American Vacuum Society (1998)
  • Thinker Award of Tegal Corporation, SEMICON West (1993)
  • Electronics Division Award of the Electrochemical Society (1992)
  • Six IBM Invention Plateau Awards (1982-1993)
  • IBM Outstanding Technical Achievement Award (1989)
  • Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985)
  • State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982)
  • Fellow of the Institute of International Education, New York (1980)
  • Presidential Fellow, State University of New York, Albany (1978-1981)

Google Scholar

Professor Oehrlein's research interests include scientific and technological aspects of materials processing using partially ionized gases or plasmas.  Low-temperature plasmas are characterized by a gas temperature that remains close to ambient temperature, whereas the electron and ion temperatures can be much higher.  These kinds of plasmas enable unique processing of advanced materials at both low pressure and atmospheric pressure.  A great deal of the work in Prof. Oehrlein's research group is focused on understanding the interactions of plasma with surfaces of materials and how plasma-surface interactions may be controlled to alter properties of materials in desirable ways.

  • Applications of low-temperature plasma science and technology to materials processing
  • Surface chemistry and physics of thin film growth
  • Etching and modification
  • Plasma-surface and plasma-polymer interactions
  • In-situ plasma and surface diagnostics
  • Physics and chemistry of ion-induced surface processes and of imaging and templating materials
  • Nanoscale structure and device fabrication and characterization
  • Surface and bulk defects of materials

 


For a complete list of publications, please visit Professor Oehrlein's web site

Prof. Gottlieb Oehrlein and team cultivate a way to decontaminate raw produce using plasma science

Prof. Gottlieb Oehrlein and team cultivate a way to decontaminate raw produce using plasma science

Gottlieb Oehrlein to receive John Thornton Memorial Award (AVS)

Gottlieb Oehrlein to receive John Thornton Memorial Award (AVS)

Bartis Wins Wylie Fellowship for Research on Plasma for Disinfection

Award supports students in final stages of dissertation work.

Invention of the Year Finalist

unprecedented etching control of a material, one atomic layer at a time

Feodor Lynen Fellow Joins MSE and IREAP

Evelina Vogli to study use of plasma in specialized coating production.

  • International Plasma Chemistry Society (2017)
  • International Union of Pure and Applied Chemistry (2000)
  • American Vacuum Society (1998)